IMS Nanofabrication Announces Equity Funding Round with Intel Capital and Photronics - MarketWatch: "VIENNA, Dec 07, 2011 (BUSINESS WIRE) -- IMS Nanofabrication AG ( www.ims.co.at ), an innovator in nanometer scale mask and direct write lithography imaging technology for semiconductor manufacturing applications, today announced that it has signed an equity funding round with participation from Intel Capital, Photronics Inc. and private investor groups.
"We are pleased to announce the funding support being provided by Intel Capital, Photronics and our existing investor groups as we work to commercialize our electron multi-beam mask exposure tool (eMET) for sub 22nm mask writing applications," said Max Bayerl, CEO of IMS. "The additional resources will help IMS to demonstrate a 256 thousand e-beam mask writer column with initial exposures by the end of 2011." Technical feasibility for the eMET platform concept was established via work completed under a proof of writing strategy (POWS) program completed earlier in 2011."
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